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Low Energy Ion Induced Desorption on Technical Surfaces
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160 b
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The ion-induced desorption of Oxygen-Free High§Conductivity (OFHC) copper samples has been studied§at room temperature for various primary ions: noble§gas ions and ions produced by the ionization of the§common gases encountered in accelerator vacuum§systems, i.e. H2+ CH4+ CO+ and CO2+. The measured§dependence of the desorption yields, i.e. the number§of molecules released from the sample surface by§incoming ions is presented and discussed subjected to§the mass, energy and nature of the incident ions. In§this context, the decrease of the ion-induced§desorption yield as a function of the incident ion§dose (so called "beam cleaning") has been studied for§OFHC-copper and other materials. From these§measurements, desorption cross-sections have been§calculated and are compared with results from§corresponding measurements found in the literature. A§model, which relates the sputter yield with the§nuclear and electronic energy loss of ions in matter,§has been applied to the ion-induced desorption:§Conclusions concerning the influence of the mass and§energy on the mechanism of desorption are presented.
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