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In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502

Name: In Situ Process Diagnostics and Intelligent Materials Processing: Volume 502
Brand: Cambridge University Press
SKU: 02060154
Price: 47.1 EUR
Availability: InStock
Author: Peter A. RosenthalWalter M. DuncanJohn A. Woollam
ISBN: 9781558994072

Peter A. RosenthalWalter M. DuncanJohn A. Woollam

Língua

Inglês

Livro Livro de capa dura

Código Libristo: 02060154

Editoras Cambridge University Press, julho 1998

This book focuses on the rapidly developing field of sensor technology for process monitoring and co... Descrição completa

Código Libristo: 02060154

114 b

47.10 €

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This book focuses on the rapidly developing field of sensor technology for process monitoring and control during fabrication of advanced materials and structures. Research in sensor driven, closed-loop control of the fabrication process (i.e., process-state monitoring), as well as product-state (e.g., wafer-state) monitoring are discussed. Featured are process techniques that include chemical vapor deposition (CVD), metalorganic chemical vapor deposition (MOCVD), plasma-enhanced chemical vapor deposition (PECVD), molecular beam epitaxy (MBE), rapid thermal processing (RTP), reactive-ion and plasma etching, electron beam evaporation, pulsed laser deposition (PLD), and sputtering. Materials of interest include electronic and optical thin films such as semiconductors, epitaxial oxides, metals and dielectrics, as well as particles and nanostructured materials. Sensing techniques for monitoring variables such as temperature, composition, optical properties, film thickness and particle-size distribution are highlighted. Topics include: sensor technologies and semiconductor diagnostics; sensor technologies and thin-film diagnostics; in situ diagnostics of oxide film growth and processes and intelligent processing of electronic ceramics.