Contacto
Como comprar
Entrega
Guia de compras
DUV-resist stripping with ozonated water in semiconductor industry
Inglês
182 b
Até 30 dias para devoluções
Os clientes também compraram
/
Capa mole
33.90
€
/
Capa mole
44.80
€
/
Capa mole
17.96
€
/
Capa mole
63.98
€
The ongoing miniaturisation in the semiconductor industry places many major challenges for materials as well as the process design. A very important step is the residue-free and gentle stripping of photo-resists. The standard process is a sequence of plasma etching and wet chemical cleaning. Hence, with actual structures of 32 nm and new materials for high- and low-k dielectrics, the aggressive plasma etching has come to its limits. For the future it is thus essential to find a non-destructive wet cleaning method. Such alternatives already exist originated from the standard SPM, modified to SOM and finally to ozonated water. This chemistry not only is cost efficient and eco-friendly, it has also proven its feasibility with i-line resists. The challenge now is to adapt this chemistry to currently applied DUV-resists which essentially differ in their structures. All-important is to find a way to remove the crust generated on the resists during implantation steps, being impossible by wet chemistry yet. The eventual purpose of this work is to achieve an understanding of all the parameters involved, in order to be able to design individual solutions for each resist and process step.
Sobre o livro
Inglês
Categorias
Ofereça este livro hoje
É fácil
1 Adicione ao carrinho e escolha Entregar como presente ao finalizar a compra 2 Receberá um vale 3 O livro chegará ao endereço do destinatárioTambém pode estar interessado em
/
Livro de capa dura
33.80
€
/
Livro de capa dura
211.33
€
/
Capa mole
12.71
€
/
Capa mole
26.84
€
/
Capa mole
13.62
€
/
Capa mole
6.15
€
/
Adobe ePub DRM
57.52
€
Olá! Sou o Libroamiko, o seu conselheiro de livros.
Como posso ajudar?